SOLID-STATE DEVICE LAB

MOSFET Visualisation & Simulation

Depletion Regions, Inversion Layer, Pinch-Off & I-V Analytics • Dr. Gerard Joseph Lim

NMOS Enhancement Pinch-Off
Semiconductor Cross-Section n⁺ - p - n⁺ Enhancement MOSFET (L = 1.0 μm)
Surface Energy Band Diagram (Source → Channel → Drain) EC, EFS, Ei, EV • qVDS Energy Separation
Saturation / Pinch-Off
V_DS ≥ V_DS(sat)
ID Formula: I_D = ½ μ_n C_ox (W/L) (V_GS - V_T)² (1 + λV_DS)
Pinch-Off: V_DS(sat) = V_GS - V_T = 2.00 V - 0.70 V = 1.30 V
Modulation: ΔL = 0.082 μm • r_o ≈ 1/(λ I_D) = 45.2 kΩ
Drain Current ID 1.42 mA
Pinch-Off VDS(sat) 1.30 V
Transconductance gm 1.85 mS
Output Resist. ro 45.2 kΩ
VGS Family Pinch-off (VDS(sat)) Operating Point (Q)
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